Burt, D, Al-Attili, AZ, Li, Z et al. (8 more authors) (2017) Strain-engineering in Germanium membranes towards light sources on Silicon. In: 2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM 2017). 2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM 2017), 28 Feb - 02 Mar 2017, Toyama, Japan. IEEE , pp. 92-94.
Abstract
Bi-axially strained Germanium (Ge) is an ideal material for Silicon (Si) compatible light sources, offering exciting applications in optical interconnect technology. By employing a novel suspended architecture with an optimum design on the curvature, we applied a biaxial tensile strain as large as 0.85% to the central region of the membrane.
Metadata
Item Type: | Proceedings Paper |
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Authors/Creators: |
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Copyright, Publisher and Additional Information: | (c) 2017 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other users, including reprinting/ republishing this material for advertising or promotional purposes, creating new collective works for resale or redistribution to servers or lists, or reuse of any copyrighted components of this work in other works. |
Dates: |
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Institution: | The University of Leeds |
Academic Units: | The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Electronic & Electrical Engineering (Leeds) > Pollard Institute (Leeds) The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Mechanical Engineering (Leeds) > Institute of Engineering Systems and Design (iESD) (Leeds) |
Depositing User: | Symplectic Publications |
Date Deposited: | 18 Aug 2017 08:32 |
Last Modified: | 22 Jan 2018 14:01 |
Published Version: | http://ieeexplore.ieee.org/document/7947522/ |
Status: | Published |
Publisher: | IEEE |
Identification Number: | 10.1109/EDTM.2017.7947522 |
Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:120290 |