Wang, Y., Jia, H., Park, J.-S. et al. (24 more authors) (2026) Mid-infrared InAs/InP quantum-dot lasers. Light: Science & Applications, 15. 64. ISSN: 2047-7538
Abstract
Mid-infrared semiconductor lasers operating in the 2.0–5.0 μm spectral range play an important role for various applications, including trace-gas detection, biomedical analysis, and free-space optical communication. InP-based quantum-well (QW) and quantum-dash (Qdash) lasers are promising alternatives to conventional GaSb-based QW lasers because of their lower cost and mature fabrication infrastructure. However, they suffer from high threshold current density (Jth) and limited operation temperatures. InAs/InP quantum-dot (QD) lasers theoretically offer lower Jth owing to their three-dimensional carrier confinement. Nevertheless, achieving high-density, uniform InAs/InP QDs with sufficient gain for lasing over 2 μm remains a major challenge. Here, we report the first demonstration of mid-infrared InAs/InP QD lasers emitting beyond 2 μm. Five-stack InAs/In0.532Ga0.468As/InP QDs grown by molecular-beam epitaxy exhibit room-temperature photoluminescence at 2.04 μm. Edge-emitting lasers achieve lasing at 2.018 μm with a low Jth of 589 A cm−2 and a maximum operation temperature of 50 °C. Notably, the Jth per layer (118 A cm−2) is the lowest ever reported for room-temperature InP-based mid-infrared lasers, outperforming QW/Qdash counterparts. These results pave the way for a new class of low-cost, high-performance mid-infrared light sources using InAs/InP QDs, marking a notable step forward in the development of mid-infrared semiconductor lasers.
Metadata
| Item Type: | Article |
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| Authors/Creators: |
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| Copyright, Publisher and Additional Information: | © The Author(s) 2026. This is an open access article under the terms of the Creative Commons Attribution License (CC-BY 4.0), which permits unrestricted use, distribution and reproduction in any medium, provided the original work is properly cited. |
| Dates: |
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| Institution: | The University of Leeds |
| Academic Units: | The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Chemical & Process Engineering (Leeds) |
| Date Deposited: | 23 Jan 2026 12:40 |
| Last Modified: | 23 Jan 2026 12:40 |
| Status: | Published |
| Publisher: | Springer Nature |
| Identification Number: | 10.1038/s41377-025-02167-4 |
| Related URLs: | |
| Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:236818 |
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