Concentration profiles of OH and H2O2 in plasma-treated water: influence of power, gas mixture and treatment distance

Schöne, Anna Lena, Schüttler, Steffen, Mroß, Talisha et al. (4 more authors) (2025) Concentration profiles of OH and H2O2 in plasma-treated water: influence of power, gas mixture and treatment distance. Journal of Physics D: Applied Physics. 375203. ISSN: 1361-6463

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Metadata

Item Type: Article
Authors/Creators:
Keywords: physics.plasm-ph
Dates:
  • Accepted: 21 August 2025
  • Published: 12 September 2025
Institution: The University of York
Academic Units: The University of York > Faculty of Sciences (York) > Physics (York)
Depositing User: Pure (York)
Date Deposited: 12 Sep 2025 15:10
Last Modified: 20 Sep 2025 09:46
Published Version: https://doi.org/10.1088/1361-6463/adfdf2
Status: Published
Refereed: Yes
Identification Number: 10.1088/1361-6463/adfdf2
Open Archives Initiative ID (OAI ID):

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