Jia, S., Le Boulbar, E.D., Balram, K.C. et al. (5 more authors) (2019) Waveguide integrated GaN distributed Bragg reflector cavity using low-cost nanolithography. Micro & Nano Letters, 14 (13). pp. 1322-1327.
Abstract
This work presents the design, fabrication and measurement of gallium nitride (GaN) distributed Bragg reflector cavities integrated with input and output grating couplers. The devices are fabricated using a new, low-cost nanolithography technique: displacement Talbot lithography combined with direct laser writing lithography. The finite-difference time-domain method has been used to design all the components and measured and modelled results show good agreement. Such devices have applications in GaN integrated photonics and biosensing.
Metadata
Item Type: | Article |
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Authors/Creators: |
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Copyright, Publisher and Additional Information: | © 2019 The Institution of Engineering and Technology. |
Dates: |
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Institution: | The University of Sheffield |
Academic Units: | The University of Sheffield > Faculty of Engineering (Sheffield) > Department of Electronic and Electrical Engineering (Sheffield) |
Funding Information: | Funder Grant number Engineering and Physical Science Research Council (EPSRC) EP/M003132/1; EP/M015181/1; EP/P006973/1 |
Depositing User: | Symplectic Sheffield |
Date Deposited: | 18 Nov 2019 10:54 |
Last Modified: | 18 Nov 2019 10:54 |
Status: | Published |
Publisher: | Institution of Engineering and Technology (IET) |
Refereed: | Yes |
Identification Number: | 10.1049/mnl.2019.0366 |
Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:153549 |