Wang, D.Q., Hamilton, A.R., Farrer, I. orcid.org/0000-0002-3033-4306 et al. (2 more authors) (2016) Double-layer-gate architecture for few-hole GaAs quantum dots. Nanotechnology, 27 (33). ISSN 0957-4484
Abstract
We report the fabrication of single and double hole quantum dots using a double-layer-gate design on an undoped accumulation mode AlxGa1-xAs/GaAs heterostructure. Electrical transport measurements of a single quantum dot show varying addition energies and clear excited states. In addition, the two-level-gate architecture can also be configured into a double quantum dot with tunable inter-dot coupling.
Metadata
| Item Type: | Article | 
|---|---|
| Authors/Creators: | 
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| Copyright, Publisher and Additional Information: | © 2016 IOP Publishing. This is an author produced version of a paper subsequently published in Nanotechnology. Uploaded in accordance with the publisher's self-archiving policy. | 
| Dates: | 
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| Institution: | The University of Sheffield | 
| Academic Units: | The University of Sheffield > Faculty of Engineering (Sheffield) > Department of Electronic and Electrical Engineering (Sheffield) | 
| Depositing User: | Symplectic Sheffield | 
| Date Deposited: | 01 Aug 2016 12:15 | 
| Last Modified: | 19 Jul 2017 01:35 | 
| Published Version: | http://dx.doi.org/10.1088/0957-4484/27/33/334001 | 
| Status: | Published | 
| Publisher: | IOP Publishing | 
| Refereed: | Yes | 
| Identification Number: | 10.1088/0957-4484/27/33/334001 | 
| Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:103204 | 

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