Impact of via placement on reflection coefficient in reflective metasurfaces

This paper investigates the impact of via placement on the reflection coefficient of a reflective patch metasurface, initially designed with resonate frequency of 4.59 GHz and a reflection magnitude of -3.7 dB. Simulations were conducted for 36 different via locations within the unit cell across a frequency range of 4.60 GHz to 4.72 GHz. The results show that specific via placements can significantly reduce the reflection magnitude, with reductions up to -35 dB at 4.60 GHz. At higher frequencies, the region of maximum absorption shifts within the unit cell. Increasing the number of vias per unit cell also shifts the resonant frequency, reaching approximately 6.25 GHz with four vias. Three Surfaces was fabricated and tested at the coordinates of interest. The findings offer insights into optimizing metasurface designs for improved control over reflection coefficient.