Dhimish, Mahmoud, Hu, Yihua, Schofield, Nigel et al. (1 more author) (2020) Mitigating Potential-Induced Degradation (PID) using SiO2 ARC layer. Energies. 5139. ISSN 1996-1073
Abstract
Potential-induced degradation (PID) of photovoltaic (PV) cells is one of the most severe types of degradation, where the output power losses in solar cells may even exceed 30%. In this article, we present the development of a suitable anti-reflection coating (ARC) structure of solar cells to mitigate the PID effect using a SiO2 ARC layer. Our PID testing experiments show that the proposed ARC layer can improve the durability and reliability of the solar cell, where the maximum drop in efficiency was equal to 0.69% after 96 h of PID testing using an applied voltage of 1000 V and temperature setting at 85 ◦C. In addition, we observed that the maximum losses in the current density are equal to 0.8 mA/cm2, compared with 4.5 mA/cm2 current density loss without using the SiO2 ARC layer.
Metadata
Item Type: | Article |
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Authors/Creators: |
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Copyright, Publisher and Additional Information: | Publisher Copyright: © 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
Keywords: | ARC,Current density,Electroluminescence imaging,PID mitigation,Solar cells |
Dates: |
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Institution: | The University of York |
Academic Units: | The University of York > Faculty of Sciences (York) > Electronic Engineering (York) |
Depositing User: | Pure (York) |
Date Deposited: | 01 Sep 2021 13:50 |
Last Modified: | 17 Oct 2024 08:49 |
Published Version: | https://doi.org/10.3390/EN13195139 |
Status: | Published |
Refereed: | Yes |
Identification Number: | 10.3390/EN13195139 |
Related URLs: | |
Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:177673 |
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Filename: energies_13_05139.pdf
Description: Mitigating Potential-Induced Degradation (PID) Using SiO2 ARC Layer
Licence: CC-BY 2.5