Frommhold, A, McClelland, A, Yang, D et al. (5 more authors) (2015) Towards 11 nm half-pitch Resolution for a Negative-tone Chemically Amplified Molecular Resist Platform for EUV Lithography. In: Wallow, TI and Hohle, CK, (eds.) Proceedings of SPIE. Advances in Patterning Materials and Processes XXXII, 23-26 Feb 2015, San Jose, California, USA. Society of Photo-optical Instrumentation Engineers (SPIE) ISBN 9781628415278
Abstract
We have synthesized a new resist molecule and investigated its high-resolution capability. The material showed resolved line-spaces with 14 nm half-pitch (hp) and the potential to pattern 11 nm hp features. Line edge roughness values as low as 3.15 nm were seen in optimized formulations. The dose-to-size is estimated at around 20-30 mJ/cm2. The role of the molecule in the patterning process was studied by comparing it with structurally similar compounds. Furthermore we present first results from exposures of our materials at the Berkeley Micro Exposure Tool. Finally it is also demonstrated that the material works as a resist in 100 kV electron beam lithography as well.
Metadata
Item Type: | Proceedings Paper |
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Authors/Creators: |
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Editors: |
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Copyright, Publisher and Additional Information: | © 2015 Society of Photo Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited. Uploaded in accordance with the publisher's self-archiving policy. |
Keywords: | EUV Lithography; Molecular Resist; Chemically Amplified Resist |
Dates: |
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Institution: | The University of Leeds |
Academic Units: | The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Electronic & Electrical Engineering (Leeds) > Institute of Communication & Power Networks (Leeds) |
Depositing User: | Symplectic Publications |
Date Deposited: | 25 Oct 2016 14:07 |
Last Modified: | 26 Jan 2018 15:54 |
Published Version: | https://doi.org/10.1117/12.2193847 |
Status: | Published |
Publisher: | Society of Photo-optical Instrumentation Engineers (SPIE) |
Identification Number: | 10.1117/12.2085672 |
Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:99042 |