Optimisation of photoresist removal from silicon wafers using atmospheric-pressure plasma jet effluent

West, Andrew orcid.org/0000-0003-4553-8640, van der Schans, Marc, Xu, Cigang et al. (3 more authors) (2015) Optimisation of photoresist removal from silicon wafers using atmospheric-pressure plasma jet effluent. In: Proc 22nd ISPC.

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Item Type: Proceedings Paper
Authors/Creators:
Dates:
  • Published: 2015
Institution: The University of York
Academic Units: The University of York > Faculty of Sciences (York) > Physics (York)
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EPSRC
EP/K018388/1
Depositing User: Pure (York)
Date Deposited: 23 Jun 2016 09:31
Last Modified: 21 Jan 2025 18:22
Status: Published
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