Frommhold, A, Yang, D, McClelland, A et al. (5 more authors) (2015) Novel Molecular Resist for EUV and Electron Beam Lithography. Journal of Photopolymer Science and Technology, 28 (4). pp. 537-540. ISSN 0914-9244
Abstract
A novel molecular resist molecule was prepared by incorporation of 1,8-diazabicycloundece-7-ene into a tert-butyloxycarbonyl protected phenol malonate group. The resist shows high-resolution capability in both extreme ultraviolet (EUV) and electron beam lithography.
Metadata
Item Type: | Article |
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Authors/Creators: |
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Keywords: | molecular photoresist; extreme ultraviolet; electron beam; lithography |
Dates: |
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Institution: | The University of Leeds |
Academic Units: | The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Electronic & Electrical Engineering (Leeds) > Institute of Communication & Power Networks (Leeds) The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Electronic & Electrical Engineering (Leeds) > Pollard Institute (Leeds) |
Depositing User: | Symplectic Publications |
Date Deposited: | 15 Feb 2016 09:50 |
Last Modified: | 15 Feb 2016 09:50 |
Published Version: | http://dx.doi.org/10.2494/photopolymer.28.537 |
Status: | Published |
Publisher: | Technical Assoc of Photopolymers Japan |
Identification Number: | 10.2494/photopolymer.28.537 |
Related URLs: | |
Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:93700 |
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