Henrichs, L, Chen, L and Bell, A (2016) Simple technique for high-throughput marking of distinguishable. Journal of Microscopy, 262 (1). pp. 28-32. ISSN 0022-2720
Abstract
Today’s (nano)-functional materials, usually exhibiting complex physical properties require local investigation with different microscopy techniques covering different physical aspects such as dipolar and magnetic structure. However, often these must be employed on the very same sample position to be able to truly correlate those different information and corresponding properties. This can be very challenging if not impossible especially when samples lack prominent features for orientation. Here, we present a simple but effective method to mark hundreds of approx. 15x15 μm sample areas at one time by using a commercial TEM grid as shadow mask in combination with thin-film deposition. Areas can be easily distinguished when using a reference or finder grid structure as shadow mask. We show that the method is suitable to combine many techniques such as light microscopy, scanning probe microscopy and scanning electron microscopy. Furthermore, we find that best results are achieved when depositing aluminium on a flat sample surface using electron-beam evaporation which ensures good line-of-sight deposition. This inexpensive high-throughput method has several advantageous over other marking techniques such as focused ion-beam (FIB) processing especially when batch processing or marking of many areas is required. Nevertheless, the technique could be particularly valuable, when used in junction with e.g. FIB sectioning to obtain a thin lamellar of a particular pre-selected area.
Metadata
Item Type: | Article |
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Authors/Creators: |
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Copyright, Publisher and Additional Information: | (c) 2015 The Authors, Journal of Microscopy (c)2015 Royal Microscopical Society. This is the peer reviewed version of the following article: Henrichs, L, Chen, L and Bell, A (2015) Simple technique for high-throughput marking of distinguishable. Journal of Microscopy, which has been published in final form at http://dx.doi.org/10.1111/jmi.12337. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Self-Archiving |
Keywords: | Batch processing, beam, focused ion-beam, focused ion, high-throughput, marking, microscopy, nanotechnology, PFM, sample preparation, SEM, TEM grid |
Dates: |
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Institution: | The University of Leeds |
Academic Units: | The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Chemical & Process Engineering (Leeds) > Institute for Materials Research (Leeds) The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Electronic & Electrical Engineering (Leeds) > Pollard Institute (Leeds) |
Depositing User: | Symplectic Publications |
Date Deposited: | 11 Dec 2015 15:18 |
Last Modified: | 16 Nov 2016 12:09 |
Published Version: | http://dx.doi.org/10.1111/jmi.12337 |
Status: | Published |
Publisher: | Wiley |
Identification Number: | 10.1111/jmi.12337 |
Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:92514 |