White, B.S., Sandall, I.C., David, J.P.R. et al. (1 more author) (2015) InAs diodes fabricated using be ion implantation. IEEE Transactions on Electron Devices, 62 (9). 2928 - 2932. ISSN: 0018-9383
Abstract
Be ion implantation and annealing conditions were optimized to demonstrate an effective method for selective area p-type doping in InAs. Optimized implantation and annealing conditions were subsequently utilized to produce planar InAs diodes. The Be implanted planar diodes had a superior dynamic resistance-area product and comparable dark current with n-i-p InAs mesa diodes when operated at low temperatures.
Metadata
| Item Type: | Article |
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| Authors/Creators: |
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| Copyright, Publisher and Additional Information: | © 2015 IEEE. This work is licensed under a Creative Commons Attribution 3.0 License. For more information, see http://creativecommons.org/licenses/by/3.0/ |
| Keywords: | Annealing; indium arsenide; ion implantation; photodiode |
| Dates: |
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| Institution: | The University of Sheffield |
| Academic Units: | The University of Sheffield > Faculty of Engineering (Sheffield) > Department of Electronic and Electrical Engineering (Sheffield) |
| Date Deposited: | 27 Oct 2015 16:50 |
| Last Modified: | 14 May 2026 15:01 |
| Status: | Published |
| Publisher: | Institute of Electrical and Electronics Engineers (IEEE) |
| Refereed: | Yes |
| Identification Number: | 10.1109/TED.2015.2456434 |
| Related URLs: | |
| Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:90991 |
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Filename: InAs_Diodes_Fabricated_Using_Be_Ion_Implantation.pdf
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