Schulte-Braucks, C, Stange, D, Von Den Driesch, N et al. (5 more authors) (2015) Negative differential resistance in direct bandgap GeSn p-i-n structures. Applied Physics Letters, 107 (4). 042101. ISSN 0003-6951
Abstract
Certain GeSn alloys are group IV direct bandgap semiconductors with prospects for electrical and optoelectronical applications. In this letter, we report on the temperature dependence of the electrical characteristics of high Sn-content Ge 0.89 Sn 0.11 p-i-n diodes. NiGeSn contacts were used to minimize the access resistance and ensure compatibility with silicon technology. The major emphasis is placed on the negative differential resistance in which peak to valley current ratios up to 2.3 were obtained. TCAD simulations were performed to identify the origin of the various current contributions, providing evidence for direct band to band tunneling and trap assisted tunneling.
Metadata
Item Type: | Article |
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Authors/Creators: |
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Copyright, Publisher and Additional Information: | © 2015, American Institute of Physics. This is an author produced version of a paper published in Applied Physics Letters. Uploaded in accordance with the publisher's self-archiving policy. |
Dates: |
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Institution: | The University of Leeds |
Academic Units: | The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Electronic & Electrical Engineering (Leeds) > Pollard Institute (Leeds) |
Depositing User: | Symplectic Publications |
Date Deposited: | 03 Sep 2015 15:17 |
Last Modified: | 22 Jan 2018 09:55 |
Published Version: | http://dx.doi.org/10.1063/1.4927622 |
Status: | Published |
Publisher: | American Institute of Physics |
Identification Number: | 10.1063/1.4927622 |
Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:89357 |