Walther, T. (2014) Electron microscopy of quantum dots. Journal of Microscopy, 257 (3). pp. 171-178. ISSN 1365-2818
Abstract
This brief review describes the different types of semiconductor quantum dost systems, their main applications and which types of microscopy methods are used to characterize them. Emphasis is put on the need for a comprehensive investigation of their size distribution, microstructure, chemical composition, strain state and electronic properties, all of which influence the optical properties and can be measured by different types of imaging, diffraction and spectroscopy methods in an electron microscope.
Metadata
Item Type: | Article |
---|---|
Authors/Creators: |
|
Editors: |
|
Copyright, Publisher and Additional Information: | © 2014 The Authors Journal of Microscopy © 2014 Royal Microscopical Society. This is an author produced version of a paper subsequently published in Journal of Microscopy. Uploaded in accordance with the publisher's self-archiving policy. |
Dates: |
|
Institution: | The University of Sheffield |
Academic Units: | The University of Sheffield > Faculty of Engineering (Sheffield) > Department of Electronic and Electrical Engineering (Sheffield) |
Depositing User: | Symplectic Sheffield |
Date Deposited: | 02 Jun 2015 09:08 |
Last Modified: | 21 Mar 2018 13:50 |
Published Version: | http://dx.doi.org/10.1111/jmi.12196 |
Status: | Published |
Publisher: | Wiley |
Refereed: | Yes |
Identification Number: | 10.1111/jmi.12196 |
Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:86359 |