Prompinit, P, Achalkumar, A, Walton, A et al. (3 more authors) (2014) Reversible metallisation of soft UV patterned substrates. Journal of Materials Chemistry C, 2 (29). 5916 - 5923. ISSN 2050-7526
Abstract
Soft UV (365 nm) patterning of ortho-nitrobenzyl functionalized thiol-on-gold self-assembled monolayers (SAMs) using acid catalysis, produces surfaces which can be used for the selective electro-deposition of copper. Exploiting the difference in the reduction peak potential between the photolysed and the masked regions of the SAM allows copper to be deposited selectively on those areas that have been exposed to the light. The copper can be removed by raising the electrode potential. The process is fully reversible so that depositing a pattern of copper, and removing it again is something that can be repeated many times. The copper deposited on the photolysed regions, like copper deposited on bare gold, forms a film of copper oxide, and so it is presumably formed on top of the SAM. Preliminary results for two-photon photocleavage show that it is also possible to implement patterning with sub-wavelength features.
Metadata
Item Type: | Article |
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Authors/Creators: |
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Copyright, Publisher and Additional Information: | (c) 2014, Royal Society of Chemistry. This is an author produced version of a paper published in Journal of Materials Chemistry C. Uploaded in accordance with the publisher's self-archiving policy. |
Keywords: | self-assembled monolayers; photopatterning; electrochemical deposition; two-photon photochemistry; XPS; AFM; SEM |
Dates: |
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Institution: | The University of Leeds |
Academic Units: | The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Electronic & Electrical Engineering (Leeds) > Pollard Institute (Leeds) The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Chemistry (Leeds) |
Depositing User: | Symplectic Publications |
Date Deposited: | 30 Jul 2014 10:18 |
Last Modified: | 16 Jan 2018 05:26 |
Published Version: | http://dx.doi.org/10.1039/c4tc00464g |
Status: | Published |
Publisher: | Royal Society of Chemistry |
Identification Number: | 10.1039/c4tc00464g |
Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:79870 |