7/3 fractional quantum Hall state in GaAs double quantum wells

Fu, M. orcid.org/0009-0008-7898-7884, Farrer, I. orcid.org/0000-0002-3033-4306, Ritchie, D.A. et al. (1 more author) (2026) 7/3 fractional quantum Hall state in GaAs double quantum wells. Physical Review B, 113 (20). 205433. ISSN: 2469-9950

Abstract

Metadata

Item Type: Article
Authors/Creators:
Copyright, Publisher and Additional Information:

© 2026 Published by the American Physical Society under the terms of the Creative Commons Attribution 4.0 International license (https://creativecommons.org/licenses/by/4.0/). Further distribution of this work must maintain attribution to the author(s) and the published article's title, journal citation, and DOI.

Keywords: Electrical properties; Fractional quantum Hall effect; Quantum Hall effect; Bilayer films; Quantum wells; Hall bar; Resistivity measurements
Dates:
  • Accepted: 11 May 2026
  • Published (online): 28 May 2026
  • Published: 28 May 2026
Institution: The University of Sheffield
Academic Units: The University of Sheffield > Faculty of Engineering (Sheffield) > Department of Electronic and Electrical Engineering (Sheffield)
Date Deposited: 22 Oct 2026 09:53
Last Modified: 22 Oct 2026 09:53
Status: Published
Publisher: American Physical Society (APS)
Refereed: Yes
Identification Number: 10.1103/f33x-cqrr
Related URLs:
Open Archives Initiative ID (OAI ID):

Download

Export

Statistics