Diode area melting of Ti6Al4V: effects of multi-laser processing on microstructure and residual stress

Liang, A., Veetil, S., Groom, K. et al. (1 more author) (2026) Diode area melting of Ti6Al4V: effects of multi-laser processing on microstructure and residual stress. Progress in Additive Manufacturing. ISSN: 2363-9512

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Item Type: Article
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© The Author(s) 2026. This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/.

Keywords: Diode area melting; Additive manufacturing; Residual stress; Ti6Al4V; Multiple diode lasers
Dates:
  • Submitted: 8 June 2026
  • Accepted: 27 August 2026
  • Published (online): 8 September 2026
  • Published: 8 September 2026
Institution: The University of Sheffield
Academic Units: The University of Sheffield > Faculty of Engineering (Sheffield) > School of Mechanical, Aerospace and Civil Engineering
Funding Information:
Funder
Grant number
ENGINEERING AND PHYSICAL SCIENCE RESEARCH COUNCIL
EP/W024764/1
Date Deposited: 08 Sep 2026 13:37
Last Modified: 08 Sep 2026 14:49
Status: Published online
Publisher: Springer Science and Business Media LLC
Refereed: Yes
Identification Number: 10.1007/s40964-026-01951-x
Open Archives Initiative ID (OAI ID):

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