Increasing the spatial uniformity of SiO2 films produced by plasma enhanced chemical vapor deposition using capacitively coupled plasmas with structured electrodes

Bhuva, Montu, Daly, Greg, Hassall, Geoff et al. (3 more authors) (2026) Increasing the spatial uniformity of SiO2 films produced by plasma enhanced chemical vapor deposition using capacitively coupled plasmas with structured electrodes. Journal of vacuum science & technology a-Vacuum surfaces and films. 023008. ISSN: 0734-2101

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Item Type: Article
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This is an author-produced version of the published paper. Uploaded in accordance with the University’s Research Publications and Open Access policy.
Dates:
  • Accepted: 20 January 2026
  • Published: 11 February 2026
Institution: The University of York
Academic Units: The University of York > Faculty of Sciences (York) > Physics (York)
Date Deposited: 18 Feb 2026 13:00
Last Modified: 18 Feb 2026 13:00
Status: Published
Refereed: Yes
Open Archives Initiative ID (OAI ID):

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