You, S. orcid.org/0009-0008-0739-9903, Lu, P.-H. orcid.org/0000-0003-2696-6340, Schachinger, T. orcid.org/0000-0003-2307-9092 et al. (3 more authors) (2023) Lorentz near-field electron ptychography. Applied Physics Letters, 123 (19). 192406. ISSN 0003-6951
Abstract
Over the past few years, electron ptychography has drawn considerable attention for its ability to recover high contrast and ultra-high resolution images without the need for high quality electron optics. In this Letter, we focus on electron ptychography's other potential benefits: quantitatively mapping phase variations resulting from magnetic and electric fields over extended fields of view. To this end, we propose an implementation of near-field ptychography that employs an amplitude mask located in the electron microscope's condenser aperture plane. We demonstrate the capabilities of our method by imaging a magnetic Permalloy sample and compare our results with those of off-axis electron holography.
Metadata
Item Type: | Article |
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Authors/Creators: |
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Copyright, Publisher and Additional Information: | © 2023 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
Keywords: | Communications Engineering; Engineering; Physical Sciences; Condensed Matter Physics |
Dates: |
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Institution: | The University of Sheffield |
Academic Units: | The University of Sheffield > Faculty of Engineering (Sheffield) > Department of Electronic and Electrical Engineering (Sheffield) |
Depositing User: | Symplectic Sheffield |
Date Deposited: | 18 Jan 2024 13:37 |
Last Modified: | 18 Jan 2024 13:37 |
Status: | Published |
Publisher: | AIP Publishing |
Refereed: | Yes |
Identification Number: | 10.1063/5.0169788 |
Related URLs: | |
Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:207594 |