Stencil lithography for bridging MEMS and NEMS

Ali, Basit, Karimzadehkhouei, Mehrdad, Nasr Esfahani, Mohammad orcid.org/0000-0002-6973-2205 et al. (2 more authors) (2023) Stencil lithography for bridging MEMS and NEMS. Micro and Nano Engineering. 100206. ISSN 2590-0072

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Funding Information: This work was supported by the Scientific and Technological Research Council of Turkey [grant No. 118C155 and 120E347 ]. Assistance by S. Zare Pakzad and M. Bostan Shirin of Mechanical Characterization Laboratory is highly appreciated. The authors also acknowledge Mr. Seçkin Akıncı of n 2 STAR-Koç University Nanofabrication and Nanocharacterization Center for Scientific and Technological Advanced Research for his assistance in stencil fabrication and Dr. Barış Yağcı from KUYTAM-Koç University Surface Technologies Research Center regarding microscopic characterization. Publisher Copyright: © 2023 The Authors

Keywords: HF vapor etch,MEMS,NEMS,Si nanowires,Stencil lithography
Dates:
  • Published: 1 June 2023
  • Published (online): 19 May 2023
  • Accepted: 13 May 2023
Institution: The University of York
Academic Units: The University of York > Faculty of Sciences (York) > Electronic Engineering (York)
Depositing User: Pure (York)
Date Deposited: 05 Jul 2023 08:00
Last Modified: 16 Oct 2024 19:17
Published Version: https://doi.org/10.1016/j.mne.2023.100206
Status: Published
Refereed: Yes
Identification Number: 10.1016/j.mne.2023.100206
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Description: Stencil lithography for bridging MEMS and NEMS

Licence: CC-BY 2.5

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