Bannister, C., Guy, A., Mihaylova, R. et al. (4 more authors) (2022) The influence of ambient cure chemistry and stoichiometry on epoxy coating surfaces. RSC Advances, 12 (44). pp. 28746-28754. ISSN 2046-2069
Abstract
The surface properties of epoxy resin coatings influence their function as substrates for subsequent coats. Variation in ambient cure conditions (temperature and relative humidity, RH), stoichiometry (ratio of epoxy: amine) and delay time between epoxy component mixing and film casting (“induction time”) significantly altered the surface properties of ambient cured epoxy resin coatings (Dow Epoxy Novolac D.E.N. 431, resorcinol diglycidyl ether and 4,4-diaminodicyclohexylmethane). Gravimetric analysis showed that increasing induction time significantly reduced surface layer formation (carbamation) of cured epoxy resin coatings at 80% RH but had no measurable effect at 40% RH and below. RMS surface roughness increased with increasing RH and decreased with increasing induction time and ambient cure temperature, at two stoichiometric extremes. However, the net change in surface area arising from these conditions was not sufficient to significantly alter the equilibrium contact angles or wetting regime. We conclude that the observed significant variation in surface wettability was more likely to depend on variation in surface chemistry than roughness; stoichiometry was the variable which most significantly influenced surface wettability, average void volume and fractional free volume, while cure temperature significantly influenced the extent of cure at both stoichiometries. Off-stoichiometry formulation and elevated ambient cure temperature significantly increased system average void volume while fractional free volume decreased, which may be significant for the barrier properties of the final coating.
Metadata
Item Type: | Article |
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Authors/Creators: |
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Copyright, Publisher and Additional Information: | © 2022 The Author(s). Published by the Royal Society of Chemistry. This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. (http://creativecommons.org/licenses/by/3.0/) |
Dates: |
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Institution: | The University of Sheffield |
Academic Units: | The University of Sheffield > Faculty of Science (Sheffield) > Department of Physics and Astronomy (Sheffield) |
Depositing User: | Symplectic Sheffield |
Date Deposited: | 09 Feb 2023 16:22 |
Last Modified: | 09 Feb 2023 16:22 |
Status: | Published |
Publisher: | Royal Society of Chemistry (RSC) |
Refereed: | Yes |
Identification Number: | 10.1039/d2ra05067f |
Related URLs: | |
Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:196249 |