Li, He, Stellinga, Daan P., Qiu, Yunmin et al. (5 more authors) (2019) Ultra-thin transmissive crystalline silicon high-contrast grating metasurfaces. Optics Express. pp. 30931-30940. ISSN 1094-4087
Abstract
Dielectric metasurfaces made from crystalline silicon, titanium dioxide, gallium nitride and silicon nitride have developed rapidly for applications in the visible wavelength regime. High performance metasurfaces typically require the realisation of subwavelength, high aspect ratio nanostructures, the fabrication of which can be challenging. Here, we propose and demonstrate the operation of high performance metasurfaces in ultra-thin (100 nm) crystalline silicon at the wavelength of 532 nm. Using optical beam analysis, we discuss fabrication complexity and show that our approach is more fabrication-tolerant than the nanofin approach, which has so far produced the highest performance metasurfaces, but may be difficult to manufacture, especially when using nanoimprint lithography.
Metadata
Item Type: | Article |
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Authors/Creators: |
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Dates: |
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Institution: | The University of York |
Academic Units: | The University of York > York Institute for Materials Research The University of York > Faculty of Sciences (York) > Physics (York) |
Depositing User: | Pure (York) |
Date Deposited: | 29 Oct 2019 10:20 |
Last Modified: | 16 Oct 2024 16:09 |
Published Version: | https://doi.org/10.1364/OE.27.030931 |
Status: | Published |
Refereed: | Yes |
Identification Number: | 10.1364/OE.27.030931 |
Related URLs: | |
Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:152729 |