Baker, M.A., Monclus, M.A., Rebholz, C. et al. (3 more authors) (2010) A study of the nanostructure and hardness of electron beam evaporated TiAlBN coatings. Thin Solid Films, 518 (15). pp. 4273-4280. ISSN 0040-6090
Abstract
TiAlBN coatings have been deposited by electron beam (EB) evaporation from a single TiAlBN material source onto AISI 316 stainless steel substrates at a temperature of 450 °C and substrate bias of − 100 V. The stoichiometry and nanostructure have been studied by X-ray photoelectron spectroscopy, X-ray diffraction and transmission electron microscopy. The hardness and elastic modulus were determined by nanoindentation. Five coatings have been deposited, three from hot-pressed TiAlBN material and two from hot isostatically pressed (HIPped) material. The coatings deposited from the hot-pressed material exhibited a nanocomposite nc-(Ti,Al)N/a-BN/a-(Ti,Al)B2 structure, the relative phase fraction being consistent with that predicted by the equilibrium Ti–B–N phase diagram. Nanoindentation hardness values were in the range of 22 to 32 GPa. Using the HIPped material, coating (Ti,Al)B0.29N0.46 was found to have a phase composition of 72–79 mol.% nc-(Ti,Al)(N,B)1 − x+ 21–28 mol.% amorphous titanium boride and a hardness of 32 GPa. The second coating, (Ti,Al)B0.66N0.25, was X-ray amorphous with a nitride+boride multiphase composition and a hardness of 26 GPa. The nanostructure and structure–property relationships of all coatings are discussed in detail. Comparisons are made between the single-EB coatings deposited in this work and previously deposited twin-EB coatings. Twin-EB deposition gives rise to lower adatom mobilities, leading to (111) (Ti,Al)N preferential orientation, smaller grain sizes, less dense coatings and lower hardnesses.
Metadata
Item Type: | Article |
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Authors/Creators: |
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Copyright, Publisher and Additional Information: | © 2010 Elsevier B.V. This is an author produced version of a paper subsequently published in Thin Solid Films. Uploaded in accordance with the publisher's self-archiving policy. Article available under the terms of the CC-BY-NC-ND licence (https://creativecommons.org/licenses/by-nc-nd/4.0/). |
Keywords: | Nanocomposites; Thin films; Hardness; TiAlBN; X-ray photoelectron spectroscopy; X-ray diffraction; Transmission electron microscopy |
Dates: |
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Institution: | The University of Sheffield |
Academic Units: | The University of Sheffield > Faculty of Engineering (Sheffield) > Department of Materials Science and Engineering (Sheffield) |
Depositing User: | Symplectic Sheffield |
Date Deposited: | 18 Nov 2019 14:31 |
Last Modified: | 20 Nov 2019 14:48 |
Status: | Published |
Publisher: | Elsevier |
Refereed: | Yes |
Identification Number: | 10.1016/j.tsf.2009.12.109 |
Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:152628 |
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Filename: TiAlBN paper text TSF revised 11-11-09c with tables and figures _2_.pdf
Licence: CC-BY-NC-ND 4.0