Tallents, Gregory John orcid.org/0000-0002-1409-105X (2019) Opacity effects on laser-produced plasma radiation sources. Journal of Applied Physics. 083302. ISSN 1089-7550
Abstract
The escape of spectral line radiation from laser-produced plasma radiation sources with moderate opacity is examined using a simple model of emission with a planar geometry, constant source function, and an empirically determined optical depth. The model is applied to determine the radiation produced by laser irradiation of tin targets used as the source of radiation in extreme ultraviolet (EUV) lithography. Variations in emission relative to optically thin plasmas in agreement with previous experimental measurements of both the angular variation of the emission of EUV light at 13.5 nm and the effect of plasma opacity in reducing EUV emission at laser intensities above 10^11 W cm^-2 are found. The model is extended to predict optimum conditions for future lithography radiation sources at 6:7 nm.
Metadata
Item Type: | Article |
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Authors/Creators: |
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Copyright, Publisher and Additional Information: | This is an author-produced version of the published paper. Uploaded in accordance with the publisher’s self-archiving policy. Further copying may not be permitted; contact the publisher for details. |
Dates: |
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Institution: | The University of York |
Academic Units: | The University of York > Faculty of Sciences (York) > Physics (York) |
Depositing User: | Pure (York) |
Date Deposited: | 29 Aug 2019 08:20 |
Last Modified: | 11 Mar 2025 00:06 |
Published Version: | https://doi.org/10.1063/1.5111720 |
Status: | Published online |
Refereed: | Yes |
Identification Number: | 10.1063/1.5111720 |
Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:150167 |
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