Tm³⁺ Tellurite-Modified-Silica Glass Thin Films Fabricated Using Ultrafast Laser Plasma Doping

Thin glass films have been produced by implanting Tm³⁺ doped and Tm³⁺/Er³⁺ codoped tellurite glasses into silica substrates using ultrafast laser plasma doping for the first time. The resulting glass films had thicknesses of up to 2 µm, refractive indices of 1.5 – 1.65 and exhibited photoluminscence in the 1.5 – 2.1 µm wavelength region when excited with 808 nm and 976 nm laser diodes. The OH⁻ content of the silica glass substrate was also found to have an effect on the Tm³⁺: ³F₄ photoluminescence lifetime in the modified thin glass film layer, with the high OH⁻ containing substrate exhibiting a shorter lifetime. Through optimisation of the femtosecond laser ablation parameters, we have produced crack-free thin films of Tm³⁺ doped tellurite-modified silica glass layers with good thickness uniformities of ±10 nm, and the refractive index of the modified layer is up to 13% higher than the bare substrate material.