Beddoe, SVF, Cosham, SD, Kulak, AN orcid.org/0000-0002-2798-9301 et al. (3 more authors) (2018) Phosphinecarboxamide as an unexpected phosphorus precursor in the chemical vapour deposition of zinc phosphide thin films. Dalton Transactions, 47 (28). pp. 9221-9225. ISSN 1477-9226
Abstract
This paper demonstrates the use of phosphinecarboxamide as a facile phosphorus precursor, which can be used alongside zinc acetate for the chemical vapour deposition (CVD) of adherent and crystalline zinc phosphide films. Thin films of Zn₃P₂ have a number of potential applications and phosphinecarboxamide is a safer and more efficient precursor than the highly toxic, corrosive and flammable phosphine used in previous CVD syntheses.
Metadata
Item Type: | Article |
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Authors/Creators: |
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Dates: |
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Institution: | The University of Leeds |
Academic Units: | The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Chemistry (Leeds) > Inorganic Chemistry (Leeds) |
Depositing User: | Symplectic Publications |
Date Deposited: | 08 Aug 2018 10:50 |
Last Modified: | 20 Aug 2018 13:27 |
Status: | Published |
Publisher: | Royal Society of Chemistry |
Identification Number: | 10.1039/c8dt00544c |
Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:134301 |