Exploiting nanoscale effects enables ultra-low temperature to produce porous silicon

Yan, M. and Patwardhan, S. orcid.org/0000-0002-4958-8840 (2021) Exploiting nanoscale effects enables ultra-low temperature to produce porous silicon. RSC Advances, 11 (56). pp. 35182-35186. ISSN 2046-2069

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Authors/Creators:
Copyright, Publisher and Additional Information: © 2021 The Author(s). Published by the Royal Society of Chemistry. This article is licensed under a Creative Commons Attribution 3.0 Unported Licence (http://creativecommons.org/licenses/by/3.0/)
Dates:
  • Accepted: 21 October 2021
  • Published (online): 1 November 2021
  • Published: 1 November 2021
Institution: The University of Sheffield
Academic Units: The University of Sheffield > Faculty of Engineering (Sheffield) > Department of Chemical and Biological Engineering (Sheffield)
Funding Information:
FunderGrant number
ENGINEERING AND PHYSICAL SCIENCE RESEARCH COUNCILEP/P006892/1
ENGINEERING AND PHYSICAL SCIENCE RESEARCH COUNCILEP/R025983/1
Engineering and Physical Sciences Research CouncilEP/L016818/1
Depositing User: Symplectic Sheffield
Date Deposited: 01 Nov 2021 15:30
Last Modified: 01 Nov 2021 15:30
Status: Published
Publisher: Royal Society of Chemistry
Refereed: Yes
Identification Number: https://doi.org/10.1039/D1RA07212A

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