Synthesis of high χ–Low N diblock copolymers by polymerization‐induced self‐assembly

Jennings, J., Cornel, E.J., Derry, M.J. et al. (5 more authors) (2020) Synthesis of high χ–Low N diblock copolymers by polymerization‐induced self‐assembly. Angewandte Chemie International Edition, 59 (27). pp. 10848-10853. ISSN 1433-7851

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Authors/Creators:
Copyright, Publisher and Additional Information: © 2020 The Authors. Published by Wiley-VCH Verlag GmbH & Co. KGaA. This is an open access article under the terms of the Creative Commons Attribution License, (http://creativecommons.org/licenses/by/4.0/) which permits use, distribution and reproduction in any medium, provided the original work is properly cited.
Keywords: block copolymers; nanolithography; nanoparticle processing; polymerization-induced self-assembly; solid-state morphology
Dates:
  • Published (online): 4 May 2020
  • Published: 26 June 2020
Institution: The University of Sheffield
Academic Units: The University of Sheffield > Faculty of Science (Sheffield) > Department of Chemistry (Sheffield)
Funding Information:
FunderGrant number
ENGINEERING AND PHYSICAL SCIENCE RESEARCH COUNCILEP/R003009/1
ENGINEERING AND PHYSICAL SCIENCE RESEARCH COUNCILEP/J013714/1
Depositing User: Symplectic Sheffield
Date Deposited: 21 May 2020 15:33
Last Modified: 18 Nov 2021 11:14
Status: Published
Publisher: Wiley
Refereed: Yes
Identification Number: https://doi.org/10.1002/anie.202001436
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