Ultrafast laser plasma doping of Er3+ in Si3N4-on-silicon

Kamil, SA, Chandrappan, J, Krauss, TF et al. (1 more author) (2019) Ultrafast laser plasma doping of Er3+ in Si3N4-on-silicon. Journal of Optoelectronics and Advanced Materials, 21 (11-12). pp. 710-716. ISSN 1454-4164



Keywords: Ultrafast lasers; Laser ablation; Optical materials; Er3+-doped glasses
  • Accepted: 10 December 2019
  • Published (online): 31 December 2019
  • Published: 31 December 2019
Institution: The University of Leeds
Academic Units: The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Chemical & Process Engineering (Leeds)
Funding Information:
FunderGrant number
EPSRC (Engineering and Physical Sciences Research Council)EP/M015165/1
Depositing User: Symplectic Publications
Date Deposited: 28 Apr 2020 14:25
Last Modified: 28 Apr 2020 14:25
Published Version: https://joam.inoe.ro/articles/ultrafast-laser-plas...
Status: Published
Publisher: INOE

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