Influence of the reactor environment on the selective area thermal etching of GaN nanohole arrays

Coulon, P-M., Feng, P., Damilano, B. et al. (3 more authors) (2020) Influence of the reactor environment on the selective area thermal etching of GaN nanohole arrays. Scientific Reports, 10 (1). 5642. ISSN 2045-2322

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Copyright, Publisher and Additional Information: © 2020 The Authors. This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
Keywords: Materials science; Optical materials and structures; Synthesis and processing
Dates:
  • Accepted: 12 March 2020
  • Published (online): 27 March 2020
  • Published: December 2020
Institution: The University of Sheffield
Academic Units: The University of Sheffield > Faculty of Engineering (Sheffield) > Department of Electronic and Electrical Engineering (Sheffield)
Funding Information:
FunderGrant number
ENGINEERING AND PHYSICAL SCIENCE RESEARCH COUNCILEP/M003132/1
ENGINEERING AND PHYSICAL SCIENCE RESEARCH COUNCILEP/M015181/1
ENGINEERING AND PHYSICAL SCIENCE RESEARCH COUNCILEP/P006973/1
Depositing User: Symplectic Sheffield
Date Deposited: 08 Apr 2020 13:35
Last Modified: 08 Apr 2020 13:35
Status: Published
Publisher: Springer
Refereed: Yes
Identification Number: https://doi.org/10.1038/s41598-020-62539-1

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