Wang, Y.R., Jin, C.Y., Ho, C.H. et al. (3 more authors) (2019) Thermodynamic processes on a semiconductor surface during in-situ multi-beam laser interference patterning. In: IET Optoelectronics. Semiconductor and Integrated Optoelectronics (SIOE) 2018, 27-29 Mar 2018, Cardiff, United Kingdom. Institution of Engineering and Technology , pp. 7-11.
Abstract
Laser interference has been widely used to produce one-dimensional gratings and more recently has shown great potential for two-dimensional patterning. In this study, the authors examine by simulation, its application to in-situ patterning during materials growth. To understand the potential, it is important to study the surface processes resulting from the laser-matter interaction which have a key influence on the resulting growth mechanisms. In this work, the intensity distribution and the laser-semiconductor interaction resulting from four-beam interference patterns are analysed by numerical simulations. In particular, the authors derive the time and spatially dependent thermal distribution along with the thermal-induced desorption and surface diffusion. The results provide a crucial understanding of the light-induced thermal profile and show that the surface temperature and the surface adatom kinetics can be controlled by multi-beam pulsed laser interference patterning due to photothermal reactions. The approach has potential as an in-situ technique for the fast and precise nanostructuring of semiconductor material surfaces.
Metadata
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Copyright, Publisher and Additional Information: | © The Institution of Engineering and Technology 2018. This is an author produced version of a paper subsequently published in IET Optoelectronics. Uploaded in accordance with the publisher's self-archiving policy. | ||||||
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Institution: | The University of Sheffield | ||||||
Academic Units: | The University of Sheffield > Faculty of Engineering (Sheffield) > Department of Electronic and Electrical Engineering (Sheffield) | ||||||
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Depositing User: | Symplectic Sheffield | ||||||
Date Deposited: | 08 Mar 2019 13:48 | ||||||
Last Modified: | 11 Mar 2019 09:08 | ||||||
Published Version: | https://doi.org/10.1049/iet-opt.2018.5028 | ||||||
Status: | Published | ||||||
Publisher: | Institution of Engineering and Technology | ||||||
Refereed: | Yes | ||||||
Identification Number: | https://doi.org/10.1049/iet-opt.2018.5028 |