Valence Band Control of Metal Silicide Films via Stoichiometry

Streller, F, Qi, Y, Yang, J et al. (3 more authors) (2016) Valence Band Control of Metal Silicide Films via Stoichiometry. Journal of Physical Chemistry Letters, 7 (13). pp. 2573-2578. ISSN 1948-7185

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Copyright, Publisher and Additional Information: © 2016, American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in Journal of Physical Chemistry Letters, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see http://dx.doi.org/10.1021/acs.jpclett.6b00799
Dates:
  • Published: 20 June 2016
  • Accepted: 20 June 2016
  • Published (online): 20 June 2016
Institution: The University of Leeds
Academic Units: The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Mechanical Engineering (Leeds) > Institute of Functional Surfaces (Leeds)
Depositing User: Symplectic Publications
Date Deposited: 09 Aug 2016 11:45
Last Modified: 01 Jul 2017 17:54
Published Version: http://dx.doi.org/10.1021/acs.jpclett.6b00799
Status: Published
Publisher: American Chemical Society
Identification Number: https://doi.org/10.1021/acs.jpclett.6b00799

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