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Number of items: 3.

Article

Yang, DX, Frommhold, A, McClelland, A et al. (6 more authors) (2016) Performance of a high resolution chemically amplified electron beam resist at various beam energies. Microelectronic Engineering, 155. pp. 97-101. ISSN 0167-9317

Frommhold, A, Yang, D, McClelland, A et al. (5 more authors) (2015) Novel Molecular Resist for EUV and Electron Beam Lithography. Journal of Photopolymer Science and Technology, 28 (4). pp. 537-540. ISSN 0914-9244

Proceedings Paper

Frommhold, A, McClelland, A, Yang, D et al. (5 more authors) (2015) Towards 11 nm half-pitch Resolution for a Negative-tone Chemically Amplified Molecular Resist Platform for EUV Lithography. In: Wallow, TI and Hohle, CK, (eds.) Proceedings of SPIE. Advances in Patterning Materials and Processes XXXII, 23-26 Feb 2015, San Jose, California, USA. Society of Photo-optical Instrumentation Engineers (SPIE) . ISBN 9781628415278

This list was generated on Sun Oct 13 03:48:18 2019 BST.