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Proceedings Paper

Frommhold, A, McClelland, A, Yang, D et al. (5 more authors) (2015) Towards 11 nm half-pitch Resolution for a Negative-tone Chemically Amplified Molecular Resist Platform for EUV Lithography. In: Wallow, TI and Hohle, CK, (eds.) Proceedings of SPIE. Advances in Patterning Materials and Processes XXXII, 23-26 Feb 2015, San Jose, California, USA. Society of Photo-optical Instrumentation Engineers (SPIE) . ISBN 9781628415278

This list was generated on Mon Aug 19 11:52:35 2019 BST.