Frommhold, A, Yang, D, McClelland, A et al. (5 more authors) (2015) Novel Molecular Resist for EUV and Electron Beam Lithography. Journal of Photopolymer Science and Technology, 28 (4). pp. 537-540. ISSN 0914-9244
Abstract
A novel molecular resist molecule was prepared by incorporation of 1,8-diazabicycloundece-7-ene into a tert-butyloxycarbonyl protected phenol malonate group. The resist shows high-resolution capability in both extreme ultraviolet (EUV) and electron beam lithography.
Metadata
| Authors/Creators: |
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| Keywords: | molecular photoresist; extreme ultraviolet; electron beam; lithography |
| Dates: |
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| Institution: | The University of Leeds |
| Academic Units: | The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Electronic & Electrical Engineering (Leeds) > Institute of Communication & Power Networks (Leeds) The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Electronic & Electrical Engineering (Leeds) > Pollard Institute (Leeds) |
| Depositing User: | Symplectic Publications |
| Date Deposited: | 15 Feb 2016 09:50 |
| Last Modified: | 15 Feb 2016 09:50 |
| Published Version: | http://dx.doi.org/10.2494/photopolymer.28.537 |
| Status: | Published |
| Publisher: | Technical Assoc of Photopolymers Japan |
| Identification Number: | https://doi.org/10.2494/photopolymer.28.537 |
| Related URLs: |
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