Novel Molecular Resist for EUV and Electron Beam Lithography

Frommhold, A, Yang, D, McClelland, A et al. (5 more authors) (2015) Novel Molecular Resist for EUV and Electron Beam Lithography. Journal of Photopolymer Science and Technology, 28 (4). pp. 537-540. ISSN 0914-9244

Abstract

Metadata

Authors/Creators:
  • Frommhold, A
  • Yang, D
  • McClelland, A
  • Roth, J
  • Xue, X
  • Rosamond, MC
  • Linfield, EH
  • Robinson, APG
Keywords: molecular photoresist; extreme ultraviolet; electron beam; lithography
Dates:
  • Published: 5 October 2015
  • Accepted: 15 June 2015
Institution: The University of Leeds
Academic Units: The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Electronic & Electrical Engineering (Leeds) > Institute of Communication & Power Networks (Leeds)
The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Electronic & Electrical Engineering (Leeds) > Pollard Institute (Leeds)
Depositing User: Symplectic Publications
Date Deposited: 15 Feb 2016 09:50
Last Modified: 15 Feb 2016 09:50
Published Version: http://dx.doi.org/10.2494/photopolymer.28.537
Status: Published
Publisher: Technical Assoc of Photopolymers Japan
Identification Number: https://doi.org/10.2494/photopolymer.28.537
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