Novel sputtering-technology for grain-size control

Vopsaroiu, M, Thwaites, M J, Rand, S et al. (2 more authors) (2004) Novel sputtering-technology for grain-size control. IEEE Transactions on Magnetics. pp. 2443-2445. ISSN 1941-0069

Abstract

Metadata

Authors/Creators:
  • Vopsaroiu, M
  • Thwaites, M J
  • Rand, S
  • Grundy, P J
  • O'Grady, K (kevin.ogrady@york.ac.uk)
Copyright, Publisher and Additional Information: Copyright © 2004 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
Keywords: Cr thin films,grain-size control,novel plasma sputtering,THIN-FILMS
Dates:
  • Published: July 2004
Institution: The University of York
Academic Units: The University of York > Physics (York)
The University of York > Faculty of Sciences (York) > Physics (York)
Depositing User: Sherpa Assistant
Date Deposited: 19 Sep 2005
Last Modified: 04 Jun 2017 00:15
Published Version: http://dx.doi.org/10.1109/TMAG.2004.828971
Status: Published
Refereed: Yes
Identification Number: https://doi.org/10.1109/TMAG.2004.828971

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