Novel sputtering-technology for grain-size control

Vopsaroiu, M, Thwaites, M J, Rand, S et al. (2 more authors) (2004) Novel sputtering-technology for grain-size control. IEEE Transactions on Magnetics. pp. 2443-2445. ISSN 1941-0069



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Keywords: Cr thin films,grain-size control,novel plasma sputtering,THIN-FILMS
  • Published: July 2004
Institution: The University of York
Academic Units: The University of York > Faculty of Sciences (York) > Physics (York)
Depositing User: Sherpa Assistant
Date Deposited: 19 Sep 2005
Last Modified: 17 Jan 2020 00:07
Published Version:
Status: Published
Refereed: Yes
Identification Number:
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