Double crystal x-ray diffraction simulations of diffusion in semiconductor microstructures

Fatah, J.M., Harrison, P., Stirner, T., Hogg, J.H.C. and Hagston, W.E. (1998) Double crystal x-ray diffraction simulations of diffusion in semiconductor microstructures. Journal of Applied Physics, 83 (8). pp. 4037-4041. ISSN 1089-7550

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Authors/Creators:
  • Fatah, J.M.
  • Harrison, P.
  • Stirner, T.
  • Hogg, J.H.C.
  • Hagston, W.E.
Copyright, Publisher and Additional Information: Copyright © 1998 American Institute of Physics. Reproduced in accordance with the publisher's self-archiving policy. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
Institution: The University of Leeds
Academic Units: The University of Leeds > Faculty of Engineering (Leeds) > School of Electronic & Electrical Engineering (Leeds) > Institute of Microwaves and Photonics (Leeds)
Depositing User: Repository Officer
Date Deposited: 01 Nov 2006
Last Modified: 16 Sep 2016 17:16
Published Version: http://dx.doi.org/10.1063/1.367159
Status: Published
Publisher: American Institute of Physics
Refereed: Yes
Identification Number: 10.1063/1.367159

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