BiVO4 based high k microwave dielectric materials: a review

Zhou, D., Pang, L.X., Wang, D.W. et al. (1 more author) (2018) BiVO4 based high k microwave dielectric materials: a review. Journal of Materials Chemistry C, 6 (35). pp. 9290-9313. ISSN 2050-7526

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Copyright, Publisher and Additional Information: © The Royal Society of Chemistry 2018. This is an author produced version of a paper subsequently published in Journal of Materials Chemistry C. Uploaded in accordance with the publisher's self-archiving policy.
Dates:
  • Accepted: 9 August 2018
  • Published (online): 9 August 2018
  • Published: 21 September 2018
Institution: The University of Sheffield
Academic Units: The University of Sheffield > Faculty of Engineering (Sheffield) > Department of Materials Science and Engineering (Sheffield)
Depositing User: Symplectic Sheffield
Date Deposited: 05 Oct 2018 15:12
Last Modified: 09 Aug 2019 00:43
Published Version: https://doi.org/10.1039/c8tc02260g
Status: Published
Publisher: Royal Society of Chemistry
Refereed: Yes
Identification Number: https://doi.org/10.1039/c8tc02260g

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