Analysis of plasma enhanced pulsed laser deposition of transition metal oxide thin films using medium energy ion scattering

Rossall, Andrew K. orcid.org/0000-0002-0123-8163, van den Berg, Jaap A., Meehan, David et al. (2 more authors) (2019) Analysis of plasma enhanced pulsed laser deposition of transition metal oxide thin films using medium energy ion scattering. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. pp. 274-278. ISSN 0168-583X

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Copyright, Publisher and Additional Information: © 2018 Elsevier B.V. All rights reserved. This is an author-produced version of the published paper. Uploaded in accordance with the publisher’s self-archiving policy.
Keywords: Inductively coupled plasma,Medium energy ion scattering,Nano-layer profiling,Plasma-enhanced pulsed laser deposition,Thin film,Transition metal oxide,Nuclear and High Energy Physics,Instrumentation
Dates:
  • Accepted: 25 June 2018
  • Published (online): 1 July 2019
  • Published: 1 July 2019
Institution: The University of York
Academic Units: The University of York > Faculty of Sciences (York) > Physics (York)
Depositing User: Pure (York)
Date Deposited: 28 Jun 2018 13:50
Last Modified: 06 Jun 2020 23:17
Published Version: https://doi.org/10.1016/j.nimb.2018.06.023
Status: Published
Refereed: Yes
Identification Number: https://doi.org/10.1016/j.nimb.2018.06.023
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