The effect of substrate clamping on the paraelectric to antiferroelectric phase transition in Nd-doped BiFeO₃ thin films

Abstract

Thin films were deposited on Pt/Ti/SiO₂/Si substrates using pulsed laser deposition from a target with a composition (Bi₀.₈₂₅Nd₀.₁₇₅Fe₀.₉₇Ti₀.₀₃O₃) with 5 mol% excess Bi₂O₃ within the antiferroelectric (AFE) region of the NdFeO₃-BiFeO₃ phase diagram. However, Raman spectroscopy and transmission electron microscopy (TEM) revealed that films consisted of a mosaic microstructure in which (AFE), ferroelectric (FE) and paraelectric (PE) phases coexisted. Variation in the spatial distribution of Nd is typically greater in bulk ceramics than in thin films and therefore, the absence of single phase AFE cannot be attributed to local changes in composition. Instead, it is proposed that clamping due to mismatch in thermal expansion coefficient with the substrate suppresses the large volume change associated with the PE-FE and PE-AFE transition in bulk and its absence in the thin film prevents an avalanche-like transition throughout grains, which in bulk sustains single phase AFE, irrespective of local deviations in the Nd concentration.

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Authors/Creators:	Zhang, HR Kalantari, K Marincel, DM Trolier-McKinstry, S MacLaren, I Ramasse, QM https://orcid.org/0000-0001-7466-2283 Rainforth, WM Reaney, IM
Copyright, Publisher and Additional Information:	© 2016 The Authors. Published by Elsevier B.V. This is an open access article under the terms of the Creative Commons Attribution License (CC-BY 4.0), which permits unrestricted use, distribution and reproduction in any medium, provided the original work is properly cited. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
Keywords:	Antiferroelectric; Phase transition; Multiferroic; Transmission electron microscopy; X-ray diffraction
Dates:	Accepted: 3 October 2016 Published (online): 4 October 2016 Published: 31 October 2016
Institution:	The University of Leeds
Academic Units:	The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Chemical & Process Engineering (Leeds)
Depositing User:	Symplectic Publications
Date Deposited:	23 Mar 2018 08:30
Last Modified:	23 Mar 2018 08:30
Status:	Published
Publisher:	Elsevier
Identification Number:	https://doi.org/10.1016/j.tsf.2016.10.004

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The effect of substrate clamping on the paraelectric to antiferroelectric phase transition in Nd-doped BiFeO₃ thin films

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