Local Plasmon Engineering in Doped Graphene

Hage, FS, Hardcastle, TP, Gjerding, MN et al. (9 more authors) (2018) Local Plasmon Engineering in Doped Graphene. ACS Nano, 12 (2). pp. 1837-1848. ISSN 1936-0851

Abstract

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Authors/Creators:
Copyright, Publisher and Additional Information: © 2018 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Nano, © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://doi.org/10.1021/acsnano.7b08650.
Keywords: boron; DFT; EELS; graphene; nitrogen; plasmon; STEM
Dates:
  • Published: 27 February 2018
  • Accepted: 25 January 2018
  • Published (online): 25 January 2018
Institution: The University of Leeds
Academic Units: The University of Leeds > Faculty of Engineering (Leeds) > School of Chemical & Process Engineering (Leeds)
Depositing User: Symplectic Publications
Date Deposited: 19 Mar 2018 14:59
Last Modified: 25 Jan 2019 01:38
Status: Published
Publisher: American Chemical Society
Identification Number: https://doi.org/10.1021/acsnano.7b08650

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