Tsui, H.C.L., Goff, L.E., Palgrave, R.G. et al. (4 more authors) (2016) Valence band offsets of Sc<inf>x</inf>Ga<inf>1-x</inf>N/AlN and Sc<inf>x</inf>Ga<inf>1-x</inf>N/GaN heterojunctions. Journal of Physics D: Applied Physics, 49 (26). ISSN 0022-3727
Abstract
The valence band offsets of ScxGa1-xN/AlN heterojunctions were measured by x-ray photoelectron spectroscopy (XPS) and were found to increase from 0.42 eV to 0.95 eV as the Sc content x increased from 0 to 0.15. The increase in valence band offset with increasing x is attributed to the corresponding increase in spontaneous polarization of the wurtzite structure. The ScxGa1-xN/AlN heterojunction is type I, similar to other III-nitride-based heterojunctions. The data also indicate that a type II staggered heterojunction, which can enhance spatial charge separation, could be formed if ScxGa1-xN is grown on GaN.
Metadata
| Item Type: | Article | 
|---|---|
| Authors/Creators: | 
  | 
        
| Copyright, Publisher and Additional Information: | © 2016 IOP Publishing  | 
        
| Keywords: | ScGaN; heterojunction; molecular beam epitaxy; X-ray photoelectron spectroscopy; valence band offset | 
| Dates: | 
  | 
        
| Institution: | The University of Sheffield | 
| Academic Units: | The University of Sheffield > Faculty of Engineering (Sheffield) > Department of Electronic and Electrical Engineering (Sheffield) | 
| Depositing User: | Symplectic Sheffield | 
| Date Deposited: | 08 Aug 2016 11:23 | 
| Last Modified: | 02 Jul 2017 01:35 | 
| Published Version: | http://dx.doi.org/10.1088/0022-3727/49/26/265110 | 
| Status: | Published | 
| Publisher: | IOP Publishing | 
| Refereed: | Yes | 
| Identification Number: | 10.1088/0022-3727/49/26/265110 | 
| Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:103203 | 

 CORE (COnnecting REpositories)
 CORE (COnnecting REpositories)