Tsui, H.C.L., Goff, L.E., Palgrave, R.G. et al. (4 more authors) (2016) Valence band offsets of Sc<inf>x</inf>Ga<inf>1-x</inf>N/AlN and Sc<inf>x</inf>Ga<inf>1-x</inf>N/GaN heterojunctions. Journal of Physics D: Applied Physics, 49 (26). ISSN 0022-3727
Abstract
The valence band offsets of ScxGa1-xN/AlN heterojunctions were measured by x-ray photoelectron spectroscopy (XPS) and were found to increase from 0.42 eV to 0.95 eV as the Sc content x increased from 0 to 0.15. The increase in valence band offset with increasing x is attributed to the corresponding increase in spontaneous polarization of the wurtzite structure. The ScxGa1-xN/AlN heterojunction is type I, similar to other III-nitride-based heterojunctions. The data also indicate that a type II staggered heterojunction, which can enhance spatial charge separation, could be formed if ScxGa1-xN is grown on GaN.
Metadata
Item Type: | Article |
---|---|
Authors/Creators: |
|
Copyright, Publisher and Additional Information: | © 2016 IOP Publishing |
Keywords: | ScGaN; heterojunction; molecular beam epitaxy; X-ray photoelectron spectroscopy; valence band offset |
Dates: |
|
Institution: | The University of Sheffield |
Academic Units: | The University of Sheffield > Faculty of Engineering (Sheffield) > Department of Electronic and Electrical Engineering (Sheffield) |
Depositing User: | Symplectic Sheffield |
Date Deposited: | 08 Aug 2016 11:23 |
Last Modified: | 02 Jul 2017 01:35 |
Published Version: | http://dx.doi.org/10.1088/0022-3727/49/26/265110 |
Status: | Published |
Publisher: | IOP Publishing |
Refereed: | Yes |
Identification Number: | 10.1088/0022-3727/49/26/265110 |
Open Archives Initiative ID (OAI ID): | oai:eprints.whiterose.ac.uk:103203 |