Kuerbanjiang, Balati orcid.org/0000-0001-6446-8209, Nedelkoski, Zlatko, Kepaptsoglou, Demie et al. (11 more authors) (2016) The role of chemical structure on the magnetic and electronic properties of Co2FeAl0.5Si0.5/Si(111) interface. Applied Physics Letters. 172412. ISSN 0003-6951
Abstract
We show that Co2FeAl0.5Si0.5 film deposited on Si(111) has a single crystal structure and twin related epitaxial relationship with the substrate. Sub-nanometer electron energy loss spectroscopy shows that in a narrow interface region there is a mutual inter-diffusion dominated by Si and Co. Atomic resolution aberration-corrected scanning transmission electron microscopy reveals that the film has B2 ordering. The film lattice structure is unaltered even at the interface due to the substitu- tional nature of the intermixing. First-principles calculations performed using structural models based on the aberration corrected electron microscopy show that the increased Si incorporation in the film leads to a gradual decrease of the magnetic moment as well as significant spin-polarization reduction. These effects can have significant detrimental role on the spin injection from the Co2FeAl0.5Si0.5 film into the Si substrate, besides the structural integrity of this junction.
Metadata
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Copyright, Publisher and Additional Information: | © 2016, The author(s) | ||||
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Institution: | The University of York | ||||
Academic Units: | The University of York > Faculty of Sciences (York) > Physics (York) The University of York > Faculty of Sciences (York) > Electronic Engineering (York) |
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Depositing User: | Pure (York) | ||||
Date Deposited: | 19 May 2016 13:48 | ||||
Last Modified: | 05 Feb 2024 00:25 | ||||
Published Version: | https://doi.org/10.1063/1.4948466 | ||||
Status: | Published | ||||
Refereed: | Yes | ||||
Identification Number: | https://doi.org/10.1063/1.4948466 |