West, Andrew orcid.org/0000-0003-4553-8640, van der Schans, Marc, Xu, Cigang et al. (3 more authors) (2015) Optimisation of photoresist removal from silicon wafers using atmospheric-pressure plasma jet effluent. In: Proc 22nd ISPC. .
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Institution: | The University of York | ||||
Academic Units: | The University of York > Faculty of Sciences (York) > Physics (York) | ||||
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Depositing User: | Pure (York) | ||||
Date Deposited: | 23 Jun 2016 09:31 | ||||
Last Modified: | 11 Jan 2024 00:22 | ||||
Status: | Published | ||||
Refereed: | No | ||||
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