Opacity effects on laser-produced plasma radiation sources

Abstract

The escape of spectral line radiation from laser-produced plasma radiation sources with moderate opacity is examined using a simple model of emission with a planar geometry, constant source function, and an empirically determined optical depth. The model is applied to determine the radiation produced by laser irradiation of tin targets used as the source of radiation in extreme ultraviolet (EUV) lithography. Variations in emission relative to optically thin plasmas in agreement with previous experimental measurements of both the angular variation of the emission of EUV light at 13.5 nm and the effect of plasma opacity in reducing EUV emission at laser intensities above 10^11 W cm^-2 are found. The model is extended to predict optimum conditions for future lithography radiation sources at 6:7 nm.

Metadata

Authors/Creators:	Tallents, Gregory John https://orcid.org/0000-0002-1409-105X
Copyright, Publisher and Additional Information:	This is an author-produced version of the published paper. Uploaded in accordance with the publisher’s self-archiving policy. Further copying may not be permitted; contact the publisher for details.
Dates:	Accepted: 7 August 2019 Published (online): 23 August 2019
Institution:	The University of York
Academic Units:	The University of York > Faculty of Sciences (York) > Physics (York)
Depositing User:	Pure (York)
Date Deposited:	29 Aug 2019 08:20
Last Modified:	06 Dec 2023 13:17
Published Version:	https://doi.org/10.1063/1.5111720
Status:	Published online
Refereed:	Yes
Identification Number:	https://doi.org/10.1063/1.5111720