Combining single source chemical vapour deposition precursors to explore the phase space of titanium oxynitride thin films

Rees, K, Lorusso, E, Cosham, SD et al. (2 more authors) (2018) Combining single source chemical vapour deposition precursors to explore the phase space of titanium oxynitride thin films. Dalton Transactions, 47 (31). pp. 10536-10543. ISSN 1477-9226

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Authors/Creators:
Dates:
  • Accepted: 5 February 2018
  • Published (online): 5 February 2018
  • Published: 21 August 2018
Institution: The University of Leeds
Academic Units: The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Chemistry (Leeds) > Inorganic Chemistry (Leeds)
Depositing User: Symplectic Publications
Date Deposited: 21 Aug 2018 10:44
Last Modified: 21 Aug 2018 10:44
Status: Published
Publisher: Royal Society of Chemistry
Identification Number: https://doi.org/10.1039/C7DT04694D

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