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Article

West, Andrew Thomas orcid.org/0000-0003-4553-8640, van der Schans, Marc, Xu, Cigang et al. (2 more authors) (2016) Fast, Downstream Removal of Photoresist Using Reactive Oxygen Species From The Effluent of An Atmospheric Pressure Plasma Jet. Plasma sources science & technology. 02LT01. ISSN 0963-0252

Proceedings Paper

West, Andrew orcid.org/0000-0003-4553-8640, van der Schans, Marc, Xu, Cigang et al. (3 more authors) (2015) Optimisation of photoresist removal from silicon wafers using atmospheric-pressure plasma jet effluent. In: Proc 22nd ISPC. UNSPECIFIED. .

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