Items where authors include "Batley, J"
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Article
Rosamond, MC, Batley, J, Burnell, G et al. (2 more authors) (2015) High contrast 3D proximity correction for electron-beam lithography: An enabling technique for the fabrication of suspended masks for complete device fabrication within an UHV environment. Microelectronic Engineering, 143. 5 - 10. ISSN 0167-9317