Novel Metal Silicide Thin Films by Design via Controlled Solid-State Diffusion

Streller, F, Agarwal, R, Mangolini, F et al. (1 more author) (2015) Novel Metal Silicide Thin Films by Design via Controlled Solid-State Diffusion. Chemistry of Materials, 27 (12). 4247 - 4253. ISSN 0897-4756

Abstract

Metadata

Authors/Creators:
  • Streller, F
  • Agarwal, R
  • Mangolini, F
  • Carpick, RW
Copyright, Publisher and Additional Information: (c) 2015, American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in Chemistry of Materials, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see http://dx.doi.org/10.1021/acs.chemmater.5b01413
Dates:
  • Accepted: 23 May 2015
  • Published: 23 June 2015
Institution: The University of Leeds
Academic Units: The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Mechanical Engineering (Leeds) > Institute of Functional Surfaces (Leeds)
Depositing User: Symplectic Publications
Date Deposited: 20 Nov 2015 16:27
Last Modified: 07 Jul 2016 09:47
Published Version: http://dx.doi.org/10.1021/acs.chemmater.5b01413
Status: Published
Publisher: American Chemical Society
Identification Number: https://doi.org/10.1021/acs.chemmater.5b01413
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