Plasma induced microstructural, compositional, and resistivity changes in ultrathin chemical vapor deposited titanium nitride films

Kröger, R., Eizenberg, M., Marcadal, C. et al. (1 more author) (2002) Plasma induced microstructural, compositional, and resistivity changes in ultrathin chemical vapor deposited titanium nitride films. Journal of Applied Physics, 91 (8). pp. 5149-5154. ISSN 0021-8979

Abstract

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Authors/Creators:
  • Kröger, R. (rk523@york.ac.uk)
  • Eizenberg, M.
  • Marcadal, C.
  • Chen, L.
Institution: The University of York
Academic Units: The University of York > Physics (York)
Depositing User: York RAE Import
Date Deposited: 20 May 2009 13:45
Last Modified: 20 May 2009 13:45
Published Version: http://dx.doi.org/10.1063/1.1459750
Status: Published
Publisher: American Institute of Physics
Identification Number: https://doi.org/10.1063/1.1459750

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